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Design principle for a p-type oxide gate layer on AlGaN/GaN toward normally-off HEMTs: Li-doped NiO as a model
Li, GJ; Li, XM; Zhao, JL; Yan, FW; Zhu, QX; Gao, XD
2020-01-21
Source PublicationJOURNAL OF MATERIALS CHEMISTRY C
ISSN2050-7526
Issue3Pages:1125
SubtypeArticle
AbstractIntegration of the p-type oxide gate layer on AlGaN/GaN is a promising approach to explore normally-off high electron mobility transistors (HEMTs). However, the critical reason for the ultralow threshold voltage in intrinsic p-type oxide gated HEMTs remains elusive. Herein, Li-doped NiO thin films with various doping contents were grown on AlGaN/GaN/Si substrates by pulsed laser deposition (PLD) to identify the most important physical properties and design principle of p-type oxide for normally-off HEMTs. With the increasing Li doping content up to 25%, Ni0.75Li0.25O on AlGaN/GaN exhibits excellent epitaxial growth quality with good interfacial state, a wide band gap of 3.65 eV and an ultrahigh hole concentration of 6.81 x 10(19) cm(-3). Nevertheless, the Ni0.75Li0.25O/AlGaN/GaN/Si heterostructure still suffers from a low threshold voltage of merely -2.12 V. By resolving the band alignment at the Ni0.75Li0.25O/AlGaN interface and the depletion mechanism for p-type Ni0.75Li0.25O on 2DEG, the band alignment matching is ascribed to be the most critical issue for intrinsic p-type oxide gated normally-off HEMTs with a low threshold voltage, that is, a relatively small energy level difference value between the conduction band of GaN and the valence band of intrinsic p-type oxide. Based on the results, the design principle of the p-type oxide gate layer on AlGaN/GaN for normally-off HEMTs is proposed, and p-type oxides doped from intrinsic n-type oxides are suspected to be competitive candidates.
DOI10.1039/c9tc04467a
WOS KeywordTHRESHOLD VOLTAGE SHIFT ; EPITAXIAL-GROWTH ; BAND OFFSETS ; THIN-FILMS ; GAN ; TECHNOLOGY ; SEMICONDUCTORS ; POLARIZATION ; INTERFACE ; MECHANISM
Language英语
WOS Research AreaMaterials Science ; Physics
PublisherROYAL SOC CHEMISTRY
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sic.ac.cn/handle/331005/28364
Collection中国科学院上海硅酸盐研究所
Recommended Citation
GB/T 7714
Li, GJ,Li, XM,Zhao, JL,et al. Design principle for a p-type oxide gate layer on AlGaN/GaN toward normally-off HEMTs: Li-doped NiO as a model[J]. JOURNAL OF MATERIALS CHEMISTRY C,2020(3):1125.
APA Li, GJ,Li, XM,Zhao, JL,Yan, FW,Zhu, QX,&Gao, XD.(2020).Design principle for a p-type oxide gate layer on AlGaN/GaN toward normally-off HEMTs: Li-doped NiO as a model.JOURNAL OF MATERIALS CHEMISTRY C(3),1125.
MLA Li, GJ,et al."Design principle for a p-type oxide gate layer on AlGaN/GaN toward normally-off HEMTs: Li-doped NiO as a model".JOURNAL OF MATERIALS CHEMISTRY C .3(2020):1125.
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