KMS Shanghai Institute of Ceramics,Chinese Academy of Sciences
Plasma resistance of transparent Y2O3 ceramics prepared by slip casting: A comparison with translucent Al2O3 | |
Liu, Wei; Jin, Lingling; Wang, Shiwei | |
2019-06-15 | |
Source Publication | MATERIALS CHEMISTRY AND PHYSICS
![]() |
ISSN | 0254-0584 |
Volume | 232Pages:471 |
Subtype | Article |
Abstract | The plasma resistance of translucent Y2O3 ceramic prepared by slip casting was studied and compared with that of translucent Al2O3 ceramic. The color after etching is almost unchanged for transparent Y2O3, while the color turns grey after etching for translucent Al2O3. The in-line transmittance (IT) for transparent Y2O3 is almost unchanged before and after etching while IT reduces similar to 5% after etching for translucent Al2O3. The etching depth of translucent Al2O3 ceramic (similar to 270 nm) is deeper than that of transparent Y2O3 ceramic (similar to 200 nm). The surface morphology of transparent ceramics Y2O3 and Al2O3 using optical microscope and SEM both show that the etching traces of translucent Al2O3 ceramic are more obvious than that of Y2O3. |
Keyword | Transparent ceramics Y2O3 Plasma resistance Optical properties |
DOI | 10.1016/j.matchemphys.2019.05.018 |
Language | 英语 |
WOS Research Area | Materials Science |
Publisher | ELSEVIER SCIENCE SA |
Citation statistics | |
Document Type | 期刊论文 |
Identifier | http://ir.sic.ac.cn/handle/331005/27046 |
Collection | 中国科学院上海硅酸盐研究所 |
Recommended Citation GB/T 7714 | Liu, Wei,Jin, Lingling,Wang, Shiwei. Plasma resistance of transparent Y2O3 ceramics prepared by slip casting: A comparison with translucent Al2O3[J]. MATERIALS CHEMISTRY AND PHYSICS,2019,232:471. |
APA | Liu, Wei,Jin, Lingling,&Wang, Shiwei.(2019).Plasma resistance of transparent Y2O3 ceramics prepared by slip casting: A comparison with translucent Al2O3.MATERIALS CHEMISTRY AND PHYSICS,232,471. |
MLA | Liu, Wei,et al."Plasma resistance of transparent Y2O3 ceramics prepared by slip casting: A comparison with translucent Al2O3".MATERIALS CHEMISTRY AND PHYSICS 232(2019):471. |
Files in This Item: | There are no files associated with this item. |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment