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Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film
Guo, Yunfeng; Zhang, Yuzhi; Chai, Xin; Zhang, Liangmiao; Wu, Lingnan; Cao, Yunzhen; Song, Lixin
2019-07-01
Source PublicationAPPLIED PHYSICS EXPRESS
ISSN1882-0778
Volume12Issue:7
SubtypeArticle
AbstractWe demonstrate a tunable broadband near-infrared absorber composed of VO2/Al2O3/ITO layers with a facile lithography-free method. Simulated and experimental spectra show that absorption bands with above 90% absorptance can be tuned from 1.62 similar to 2.42 mu m to 1.2 similar to 1.5 mu m by thermally induced VO2 phase transition. Furthermore, the absorber with VO2 in the intermediate state can yield a broadband perfect absorption over the wavelength range of 1.2 similar to 2.5 mu m. Besides high absorption performance can still be remained at the incident up to 70 degrees for both polarizations due to the presence of ultrathin layer of VO2 (lambda/52) in the absorber. (C) 2019 The Japan Society of Applied Physics
DOI10.7567/1882-0786/ab29e4
Language英语
WOS Research AreaPhysics
PublisherIOP PUBLISHING LTD
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Document Type期刊论文
Identifierhttp://ir.sic.ac.cn/handle/331005/27009
Collection中国科学院上海硅酸盐研究所
Recommended Citation
GB/T 7714
Guo, Yunfeng,Zhang, Yuzhi,Chai, Xin,et al. Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film[J]. APPLIED PHYSICS EXPRESS,2019,12(7).
APA Guo, Yunfeng.,Zhang, Yuzhi.,Chai, Xin.,Zhang, Liangmiao.,Wu, Lingnan.,...&Song, Lixin.(2019).Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film.APPLIED PHYSICS EXPRESS,12(7).
MLA Guo, Yunfeng,et al."Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film".APPLIED PHYSICS EXPRESS 12.7(2019).
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