Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film

doi:10.7567/1882-0786/ab29e4

SIC OpenIR

	Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film
	Guo, Yunfeng; Zhang, Yuzhi; Chai, Xin; Zhang, Liangmiao; Wu, Lingnan; Cao, Yunzhen; Song, Lixin
	2019-07-01
Source Publication	APPLIED PHYSICS EXPRESS
ISSN	1882-0778
Volume	12 Issue:7
Subtype	Article
Abstract	We demonstrate a tunable broadband near-infrared absorber composed of VO2/Al2O3/ITO layers with a facile lithography-free method. Simulated and experimental spectra show that absorption bands with above 90% absorptance can be tuned from 1.62 similar to 2.42 mu m to 1.2 similar to 1.5 mu m by thermally induced VO2 phase transition. Furthermore, the absorber with VO2 in the intermediate state can yield a broadband perfect absorption over the wavelength range of 1.2 similar to 2.5 mu m. Besides high absorption performance can still be remained at the incident up to 70 degrees for both polarizations due to the presence of ultrathin layer of VO2 (lambda/52) in the absorber. (C) 2019 The Japan Society of Applied Physics
DOI	10.7567/1882-0786/ab29e4
Language	英语
WOS Research Area	Physics
Publisher	IOP PUBLISHING LTD
Citation statistics
Document Type	期刊论文
Identifier	http://ir.sic.ac.cn/handle/331005/27009
Collection	中国科学院上海硅酸盐研究所
Recommended Citation GB/T 7714	Guo, Yunfeng,Zhang, Yuzhi,Chai, Xin,et al. Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film[J]. APPLIED PHYSICS EXPRESS,2019,12(7).
APA	Guo, Yunfeng.,Zhang, Yuzhi.,Chai, Xin.,Zhang, Liangmiao.,Wu, Lingnan.,...&Song, Lixin.(2019).Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film.APPLIED PHYSICS EXPRESS,12(7).
MLA	Guo, Yunfeng,et al."Tunable broadband, wide angle and lithography-free absorber in the near-infrared using an ultrathin VO2 film".APPLIED PHYSICS EXPRESS 12.7(2019).

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