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Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD
Liao Chun-Jing; Dong Shao-Ming; Jin Xi-Hai; Hu Jian-Bao; Zhang Xiang-Yu; Wu Hui-Xia
2019-11-20
Source PublicationJOURNAL OF INORGANIC MATERIALS
ISSN1000-324X
Volume34Issue:11Pages:1231
SubtypeArticle
AbstractSilicon nitride coatings on carbon fiber cloth were prepared by Low Pressure Chemical Vapor Deposition (LPCVD) from gas mixtures of SiCl4-NH3-H-2 at temperatures ranging from 750 degrees C to 1250 degrees C. The effects of deposition temperature on the growth kinetics, morphologies, chemical composition and bonding state of the coatings were investigated. The results showed that deposition rate increased monotonously with temperature up to 1050 , then it reversely decreased. In the whole temperature range, the coating surface morphology became gradually coarse with cauliflower-like grains as the deposition temperature increased. The optimal deposition temperature for infiltration was in the range between 750 and 950 degrees C. Chemical composition analysis demonstrated that the nitrogen content of the coating firstly decreased and then increased with temperature increase, while the silicon content continuously increased and the oxygen content gradually decreased in the whole temperature range. Heat treatment at 1300 degrees C and above crystallized the coating. Concurrently, a significant change in its surface morphology was observed. All heat-treated coatings were exclusively composed of alpha-Si3N4, without the presence of any beta-Si3N4.
Keywordsilicon nitride coating growth kinetic deposition temperature chemical composition heat treatment
DOI10.15541/jim20190035
Language英语
WOS Research AreaMaterials Science
PublisherSCIENCE PRESS
Citation statistics
Document Type期刊论文
Identifierhttp://ir.sic.ac.cn/handle/331005/26726
Collection中国科学院上海硅酸盐研究所
Recommended Citation
GB/T 7714
Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,et al. Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD[J]. JOURNAL OF INORGANIC MATERIALS,2019,34(11):1231.
APA Liao Chun-Jing,Dong Shao-Ming,Jin Xi-Hai,Hu Jian-Bao,Zhang Xiang-Yu,&Wu Hui-Xia.(2019).Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD.JOURNAL OF INORGANIC MATERIALS,34(11),1231.
MLA Liao Chun-Jing,et al."Deposition Temperature and Heat Treatment on Silicon Nitride Coating Deposited by LPCVD".JOURNAL OF INORGANIC MATERIALS 34.11(2019):1231.
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