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Optimization of the tape casting process for the development of high performance silicon nitride substrate
Duan, Yusen1,2; Zhang, Jingxian2; Li, Xiaoguang2; Shi, Ying1; Xie, Jianjun1; Jiang, Dongliang2
2017
发表期刊International Journal of Applied Ceramic Technology
ISSN1546542X
卷号14期号:4页码:712-718
摘要24
DOI10.1111/ijac.12679
EI入藏号20171603573190
EI主题词Electric power systems - Nitrides - Silicon nitride - Sintering - Thermal conductivity - Thermal conductivity of gases
EI分类号Compendex
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被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.sic.ac.cn/handle/331005/26081
专题中国科学院上海硅酸盐研究所
作者单位1.School of Materials Science and Engineering, Shanghai University, Shanghai, China;
2.State Key Laboratory of High Performance Ceramics and Superfine Microstructures, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai, China
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GB/T 7714
Duan, Yusen,Zhang, Jingxian,Li, Xiaoguang,et al. Optimization of the tape casting process for the development of high performance silicon nitride substrate[J]. International Journal of Applied Ceramic Technology,2017,14(4):712-718.
APA Duan, Yusen,Zhang, Jingxian,Li, Xiaoguang,Shi, Ying,Xie, Jianjun,&Jiang, Dongliang.(2017).Optimization of the tape casting process for the development of high performance silicon nitride substrate.International Journal of Applied Ceramic Technology,14(4),712-718.
MLA Duan, Yusen,et al."Optimization of the tape casting process for the development of high performance silicon nitride substrate".International Journal of Applied Ceramic Technology 14.4(2017):712-718.
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