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Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films
Esposito, V.1; Ni, D.W.2; Sanna, S.1; Gualandris, F.1; Pryds, N.1
2017
发表期刊RSC Advances
卷号7期号:23页码:13784-13788
摘要Acceptor-doped nanocrystalline cerium oxide thin films are mechanically constrained nano-domains, with film/substrate interfacial strain and chemical doping deadlock mass diffusion. In contrast, in this paper we show that chemical elements result in highly unstable thin films under chemical reduction, with unexpected diffusion-driven effects such as fast migration of grain boundaries, porosity nucleation, and interdiffusion at low temperatures. © The Royal Society of Chemistry.
DOI10.1039/c7ra01226h
EI入藏号20171003419204
EI主题词Thin films
EI分类号712.1 Semiconducting Materials - 761 Nanotechnology - 804 Chemical Products Generally
引用统计
被引频次:2[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.sic.ac.cn/handle/331005/25860
专题中国科学院上海硅酸盐研究所
作者单位1.Technical University of Denmark, Department of Energy Conversion and Storage, Frederiksborgvej 399, 4000, Denmark;
2.Shanghai Institute of Ceramics, Chinese Academy of Sciences, Heshuo Road 588#, Jiading District, Shanghai, China
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GB/T 7714
Esposito, V.,Ni, D.W.,Sanna, S.,et al. Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films[J]. RSC Advances,2017,7(23):13784-13788.
APA Esposito, V.,Ni, D.W.,Sanna, S.,Gualandris, F.,&Pryds, N..(2017).Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films.RSC Advances,7(23),13784-13788.
MLA Esposito, V.,et al."Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films".RSC Advances 7.23(2017):13784-13788.
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