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Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films
Esposito, V.1; Ni, D.W.2; Sanna, S.1; Gualandris, F.1; Pryds, N.1
2017
Source PublicationRSC Advances
Volume7Issue:23Pages:13784-13788
AbstractAcceptor-doped nanocrystalline cerium oxide thin films are mechanically constrained nano-domains, with film/substrate interfacial strain and chemical doping deadlock mass diffusion. In contrast, in this paper we show that chemical elements result in highly unstable thin films under chemical reduction, with unexpected diffusion-driven effects such as fast migration of grain boundaries, porosity nucleation, and interdiffusion at low temperatures. © The Royal Society of Chemistry.
DOI10.1039/c7ra01226h
EI Accession Number20171003419204
EI KeywordsThin films
EI Classification Number712.1 Semiconducting Materials - 761 Nanotechnology - 804 Chemical Products Generally
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Document Type期刊论文
Identifierhttp://ir.sic.ac.cn/handle/331005/25860
Collection中国科学院上海硅酸盐研究所
Affiliation1.Technical University of Denmark, Department of Energy Conversion and Storage, Frederiksborgvej 399, 4000, Denmark;
2.Shanghai Institute of Ceramics, Chinese Academy of Sciences, Heshuo Road 588#, Jiading District, Shanghai, China
Recommended Citation
GB/T 7714
Esposito, V.,Ni, D.W.,Sanna, S.,et al. Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films[J]. RSC Advances,2017,7(23):13784-13788.
APA Esposito, V.,Ni, D.W.,Sanna, S.,Gualandris, F.,&Pryds, N..(2017).Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films.RSC Advances,7(23),13784-13788.
MLA Esposito, V.,et al."Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films".RSC Advances 7.23(2017):13784-13788.
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