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Low-temperature deposition of VO2films with high crystalline degree by embedding multilayered structure
Sun, Guangyao1; Cao, Xun1; Li, Xiaoyan3; Bao, Shanhu1; Li, Ning1; Liang, Mengshi1; Gloter, Alexandre2; Gu, Hui1; Jin, Ping1,3
2017
Source PublicationSolar Energy Materials and Solar Cells
ISSN09270248
Volume161Pages:70-76
AbstractIt is a long-standing challenge in the fabrication of single-phase VO2films at low temperature on Si substrate or glass substrate due to their thermodynamic phase-instability and the polymorphic structures. Recently, the demand for high-quality thin films deposited at low temperature is strongly pushed by their applications on devices and smart windows. Thermochromic films of VO2, as well as multilayer films of VO2/ZnO and VO2/TiO2/ZnO, were made by magnetron sputtering method and characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), UV–visible-NIR spectrophotometer, (scanning) transmission electron microscopy ((S)TEM) and Electron energy loss spectroscopy (EELS). Films with high crystalline degree VO2single crystal phase were obtained at a fairly low temperature of 300 °C without subsequent annealing by embedding ZnO and TiO2layers between VO2and substrates. It is demonstrated that VO2/TiO2/ZnO films could display higher luminous transmittance and better semiconductor to metal transition (SMT) performance. Our data can serve a promising point for industrial production with high degree of crystallinity at a low temperature. © 2016 Elsevier B.V.
DOI10.1016/j.solmat.2016.11.036
EI Accession Number20164903086518
EI KeywordsTemperature
EI Classification Number525.4 Energy Losses (industrial and residential) - 641.1 Thermodynamics - 741.3 Optical Devices and Systems - 802.3 Chemical Operations - 804.2 Inorganic Compounds - 933.1 Crystalline Solids
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Document Type期刊论文
Identifierhttp://ir.sic.ac.cn/handle/331005/25839
Collection中国科学院上海硅酸盐研究所
Affiliation1.State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai institute of Ceramics, Chinese Academy of Sciences, Dingxi 1295, Changning, Shanghai; 200050, China;
2.Laboratoire de Physique des Solides, Université Paris Sud, Bât 510, Orsay; 91405, France;
3.Materials Research Institute for Sustainable Development, National Institute of Advanced Industrial Science and Technology, Nagoya; 463-8560, Japan
Recommended Citation
GB/T 7714
Sun, Guangyao,Cao, Xun,Li, Xiaoyan,et al. Low-temperature deposition of VO2films with high crystalline degree by embedding multilayered structure[J]. Solar Energy Materials and Solar Cells,2017,161:70-76.
APA Sun, Guangyao.,Cao, Xun.,Li, Xiaoyan.,Bao, Shanhu.,Li, Ning.,...&Jin, Ping.(2017).Low-temperature deposition of VO2films with high crystalline degree by embedding multilayered structure.Solar Energy Materials and Solar Cells,161,70-76.
MLA Sun, Guangyao,et al."Low-temperature deposition of VO2films with high crystalline degree by embedding multilayered structure".Solar Energy Materials and Solar Cells 161(2017):70-76.
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