SIC OpenIR
Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2
Dong, Wen1; Hu, Wanbiao1; Frankcombe, Terry J.1,2; Chen, Dehong1; Zhou, Chao3; Fu, Zhenxiao3; Cândido, Ladir4; Hai, Guoqiang5; Chen, Hua6; Li, Yongxiang7; Withers, Ray L.1; Liu, Yun1
2017
发表期刊Journal of Materials Chemistry A
ISSN20507488
卷号5期号:11页码:5436-5441
摘要Colossal permittivity (CP) materials have many important applications in electronics but their development has generally been hindered due to the difficulty in achieving a relatively low dielectric loss. In this work, we report an In + Ta co-doped TiO2material system that manifests high dielectric permittivity and low dielectric loss based on the electron-pinned defect-dipole design. The dielectric loss can be reduced down to e.g. 0.002 at 1 kHz, giving high performance, low temperature dependent dielectric properties i.e. Εr> 104with tan δ © The Royal Society of Chemistry.
DOI10.1039/c6ta08337d
EI入藏号20171203466380
EI主题词Dielectric materials
EI分类号482.2 Minerals - 543.4 Tantalum and Alloys - 641.1 Thermodynamics - 708.1 Dielectric Materials - 804.2 Inorganic Compounds - 922.1 Probability Theory - 933.1 Crystalline Solids
引用统计
文献类型期刊论文
条目标识符http://ir.sic.ac.cn/handle/331005/25491
专题中国科学院上海硅酸盐研究所
作者单位1.Research School of Chemistry, Australian National University, ACT; 2601, Australia;
2.School of Physical, Environmental and Mathematical Sciences, University of New South Wales, Canberra; ACT; 2601, Australia;
3.Fenghua Advanced Technology Holding Co. Ltd., China;
4.Instituto de Física, Universidade Federal de Goiás, Goiânia; GO; 74001-970, Brazil;
5.Instituto de Física de São Carlos, Universidade de São Paulo, São Carlos; SP; 13560-970, Brazil;
6.Centre for Advanced Microscopy, Australian National University, ACT; 2601, Australia;
7.Key Lab. of Inorganic Functional Materials and Devices, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai; 200050, China
推荐引用方式
GB/T 7714
Dong, Wen,Hu, Wanbiao,Frankcombe, Terry J.,et al. Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2[J]. Journal of Materials Chemistry A,2017,5(11):5436-5441.
APA Dong, Wen.,Hu, Wanbiao.,Frankcombe, Terry J..,Chen, Dehong.,Zhou, Chao.,...&Liu, Yun.(2017).Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2.Journal of Materials Chemistry A,5(11),5436-5441.
MLA Dong, Wen,et al."Colossal permittivity with ultralow dielectric loss in In + Ta co-doped rutile TiO2".Journal of Materials Chemistry A 5.11(2017):5436-5441.
条目包含的文件
条目无相关文件。
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[Dong, Wen]的文章
[Hu, Wanbiao]的文章
[Frankcombe, Terry J.]的文章
百度学术
百度学术中相似的文章
[Dong, Wen]的文章
[Hu, Wanbiao]的文章
[Frankcombe, Terry J.]的文章
必应学术
必应学术中相似的文章
[Dong, Wen]的文章
[Hu, Wanbiao]的文章
[Frankcombe, Terry J.]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。